Document Type

Article

Journal Title

Review of Scientific Instruments

Volume Number

61

Issue Number

11

First Page

3460

Last Page

3463

Version

Publisher PDF: the final published version of the article, with professional formatting and typesetting

Original Citation

McWilliams, R., D. Edrich, R.C. Platt and D.P. Sheehan, Simple overdense rf plasma source; Rev. Sci. Instrum. 61 3460 (1990).

Publication Date

11-1990

Disciplines

Physics

Abstract

A simple, gas‐fed, radio‐frequency‐driven plasma source is described. By use of lower hybrid waves, noble gas plasmas were produced with electron densities up to 10^12 cm -3 over a range of magnetic fields from 400 G to 1.5 kG and rf frequencies from 2–220 MHz.

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