Simple overdense rf plasma source

Author(s)

R. McWilliams, University of California, Irvine
D. Edrich, University of California, Irvine
R. C. Platt, University of California, Irvine
D. P. Sheehan, University of San DiegoFollow

Document Type

Article

Publication Date

11-1-1990

Journal Title

Review of Scientific Instruments

Volume Number

61

Issue Number

11

First Page

3460

Last Page

3463

DOI

10.1063/1.1141603

Version

Publisher PDF: the final published version of the article, with professional formatting and typesetting

Disciplines

Physics

Abstract

A simple, gas‐fed, radio‐frequency‐driven plasma source is described. By use of lower hybrid waves, noble gas plasmas were produced with electron densities up to 10^12 cm -3 over a range of magnetic fields from 400 G to 1.5 kG and rf frequencies from 2–220 MHz.

Digital USD Citation

McWilliams, R.; Edrich, D.; Platt, R. C.; and Sheehan, D. P., "Simple overdense rf plasma source" (1990). Physics and Biophysics: Faculty Scholarship. 19.
https://digital.sandiego.edu/phys-faculty/19