Document Type
Article
Journal Title
Review of Scientific Instruments
Volume Number
61
Issue Number
11
First Page
3460
Last Page
3463
Version
Publisher PDF: the final published version of the article, with professional formatting and typesetting
Original Citation
McWilliams, R., D. Edrich, R.C. Platt and D.P. Sheehan, Simple overdense rf plasma source; Rev. Sci. Instrum. 61 3460 (1990).
Publication Date
11-1990
Disciplines
Physics
Abstract
A simple, gas‐fed, radio‐frequency‐driven plasma source is described. By use of lower hybrid waves, noble gas plasmas were produced with electron densities up to 10^12 cm -3 over a range of magnetic fields from 400 G to 1.5 kG and rf frequencies from 2–220 MHz.
Digital USD Citation
McWilliams, R.; Edrich, D.; Platt, R. C.; and Sheehan, D. P., "Simple overdense rf plasma source" (1990). Physics and Biophysics: Faculty Publications. 19.
https://digital.sandiego.edu/phys-faculty/19